Sputtering targets

Sputtering targets

Pure metal and alloy targets, purity from 99% to 99.999 %.

Hot pressed oxides and intermetallic targets without binder: Al2O3, AZO, ITO, PZT, SiO2, ZnO...

Industrial application targets: Al, Ni/Cr, Mo, Ta, Ti/Al, W …

Most sputtering targets can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.

All targets are delivered with a certificate of analysis.

NEYCO
30 avenue de la Paix
92170 VANVES
Tel:+33(0)1 41 90 50 50
Fax:+33(0)1 41 90 50 51
e-mail: contact[@]neyco.fr