Sputtering targets

Pure metal and alloy targets, purity from 99% to 99.999 %.

Hot pressed oxides and intermetallic targets without binder: Al₂O₃, AZO, ITO, PZT, SiO₂, ZnO...

Industrial application targets: Al, Ni/Cr, Mo, Ta, Ti/Al, W …

Most sputtering targets can be fabricated into a wide range of shapes and sizes. There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.

All targets are delivered with a certificate of analysis.