
Sputtering targets
Neyco provides several types of targets for sputtering:
- Pure metal and alloy targets, purity from 99% to 99.999 %.
- Hot pressed oxides and intermetallic targets without binder: Al2O3, AZO, ITO, PZT, SiO2, ZnO...
- Industrial application targets: Al, Ni/Cr, Mo, Ta, Ti/Al, W …
Most sputtering targets can be fabricated into a wide range of shapes and sizes such as : circular, rectangular, Delta, ring, tube and more on request.
There are some technical limitations to the maximum size for a given single piece construction. In such cases, a multi-segmented target can be produced with the individual segments joined together by butt or beveled joints.
All targets are delivered with a certificate of analysis.
The materials are checked before shipping with a X-fluorescence analyzer. Certificate on request.
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Aluminum
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Antimony
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Barium
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Bismuth
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Boron
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Cadmium
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Calcium
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Cerium
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Cesium
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Chromium
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Cobalt
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Copper
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Dysprosium
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Erbium
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Europium
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Gadolinium
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Gallium
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Germanium
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Gold
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Graphite
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Hafnium
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Holmium
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Indium
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Iridium
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Iron
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Lanthanum
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Lead
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Lithium
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Magnesium
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Manganese
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Molybdenum
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Neodymium
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Nickel
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Niobium
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Palladium
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Platinum
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Praseodymium
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Rhenium
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Rhodium
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Ruthenium
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Samarium
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Scandium
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Selenium
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Silicon
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Silver
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Sodium
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Strontium
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Tantalum
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Tellurium
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Terbium
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Tin
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Titanium
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Tungsten
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Vanadium
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Ytterbium
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Yttrium
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Zinc
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Zirconium
30 avenue de la Paix
92170 VANVES
Tel:+33(0)1 41 90 50 50
Fax:+33(0)1 41 90 50 51
e-mail: contact[@]neyco.fr