Characterisation

XPS Spectrometry

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Characterisation

Argon Cluster Ion Source

Description

The multi-mode gas ion cluster source (GCIS) is designed to operate in both Arn+ cluster and Ar+ single atom modes making it suitable for cleaning and depth profiling of organic, inorganic or metallic thin films. In addition, it can also be used to generate low energy He+ ions for use in ion scattering spectroscopy (ISS).

  • Ideal for depth profiling of organic materials
  • Conservation of chemical state and interfaces
  • Cluster energy range: 0.2-20 keV
  • Cluster size adjustable from Ar250+ to Ar2000+.
  • Full control by ESCApe software: gas pressure, valves, parameters...
  • Can be used with Axis Supra+ and Nova2
  • Flange mounted DN64 (Ext. Diam. 4.5'')
  • Differential pumping by 2 turbomolecular pumps
  • High performance for surface cleaning and image enhancement
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Description

The multi-mode gas ion cluster source (GCIS) is designed to operate in both Arn+ cluster and Ar+ single atom modes making it suitable for cleaning and depth profiling of organic, inorganic or metallic thin films. In addition, it can also be used to generate low energy He+ ions for use in ion scattering spectroscopy (ISS).

  • Ideal for depth profiling of organic materials
  • Conservation of chemical state and interfaces
  • Cluster energy range: 0.2-20 keV
  • Cluster size adjustable from Ar250+ to Ar2000+.
  • Full control by ESCApe software: gas pressure, valves, parameters...
  • Can be used with Axis Supra+ and Nova2
  • Flange mounted DN64 (Ext. Diam. 4.5'')
  • Differential pumping by 2 turbomolecular pumps
  • High performance for surface cleaning and image enhancement

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